This paper explains how large-area Roll-to-Plate (R2P) Nanoimprint Lithography is combined with Reactive Ion Etching to address the emerging needs of a variety of demanding products. In this process sequence, the scalable R2P imprint process is used to apply a structured mask to the functional surface. In a subsequent etching step, the texture is transferred into the layer underneath. Using nanoimprinting and dry-etching in combination is a powerful method for creating large-area metal structured surfaces or optical structures in glass while improving mechanical durability and optical clarity at reduced costs and in larger volumes.
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